| 학회 |
한국고분자학회 |
| 학술대회 |
2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터) |
| 권호 |
41권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Spatially Ordered Polymer Wrinkles in Gradient Patterned Lines |
| 초록 |
Wrinkling of thin, high modulus polymer films on a relatively compliant support opens a powerful platform for creating intricate, yet well-ordered periodical sinusoidal wave-like patterns that can be controlled and aligned by elastomeric foundation in the surface of the polymer film. Fully combining controlled evaporation of confined microfluids as an alternative tool to conventional lithographic technique for generating well-ordered polymer patterns with strain-mismatch induced surface wrinkling may pull off a much simpler and more masterful methodology for structuring of periodic surface wrinkles over patterned areas and provide a new platform for characterizing mechanical properties of patterned polymer films with multi-dimensional scale ranging from micrometers to nanometers. |
| 저자 |
변명환1, Zhiqun Lin2
|
| 소속 |
1계명대, 2School of Materials Science & Engineering |
| 키워드 |
Wrinkling; Controlled evaporative self-assembly (CESA); Strain-mismatch; Gradient
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| E-Mail |
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