화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2015년 가을 (11/04 ~ 11/06, 제주국제컨벤션센터(ICCJEJU))
권호 19권 2호
발표분야 (콜로이드계면화학) 최근 연성물질 개발기술의 진보
제목 Three-dimensional Flexible Self-Assembled Nanopatterning Exploiting Graphene Based Substrates
초록 In this presentation, BCP lithography for three-dimensional, flexible and complex geometry will be introduced. Mechanically robust but compliant chemically modified graphene (CMG) film is utilized as a transferrable and disposable substrate for the BCP nanopatterning for nonplanar, flexible, and even multi-stack structures. Taking advantage of the high chemical/thermal stability, atomic scale flatness, and mechanical robustness with compliance, graphene based materials can be versatile substrates for nanopatterning. While pristine graphene has a low surface energy, CMG prepared from graphene oxide, may have a controllability of surface energy to promote wettability to a BCP thin film. Direct implementation of conventional BCP lithography process on the spin cast CMG film and subsequent transfer onto flexible or nonplanar geometries accomplishes various surface nanopatterned structures on flexible or three-dimensional geometry, including metal nanopatterns stabilized on conventional PET or PDMS substrates.
저자 김상욱
소속 National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly / Materials Science & Engineering
키워드 block copolymer; self-assembly; graphene
E-Mail