| 초록 |
Block copolymer (BCP) self-assembly draws attention as promising patterning technology, because of its high resolution, simple process and low cost. In this work, we formed BCP patterns on chemically modified graphene (CMG) film. We introduced the CMG film having high thermal/chemical stability, mechanically robust and genuine atomic scale flatness as a transferrable and disposable substrate for the self-assembled nanopatterning of nonplanar, flexible, and even multistack device oriented structures. From this process, we fabricated Au nanodot pattern and Pt nanowire pattern on flexible PET substrate. Monolayer Au nanowires didn’t show any conductive property, but double layer Au nanowires showed conductive property that has only 56Ω/□ sheet resistance. Furthermore, we fabricated Al nanowire crossbar array after double layers of orthogonal using block copolymer self-assembly on the CMG film. |
