학회 |
한국고분자학회 |
학술대회 |
2021년 봄 (04/07 ~ 04/09, 대전컨벤션센터) |
권호 |
46권 1호 |
발표분야 |
기능성 고분자 |
제목 |
The synthesis of photosensitive polyimide for semiconductor using o-nitrobenzyl ether group |
초록 |
Aromatic polyimide is a kind of excellent high performance polymer having thermal resistance and chemical resistance to radiation. Besides, since it has a relatively low dielectric constant and excellent mechanical properties, it is widely used in the space industry and semiconductor industry. Therefore a large molecular weight and flexibility has been required to improve physical properties of PI such as elongation rate. In this study, we synthesized dianhydride having a hydroxyl functional group in the molecular structure and three kinds of aromatic ethylene diamines to improve flexibility of the PI film. And then polymerization was performed using DHBA and various kinds of synthesized monomers. After polymerization, o-nitrobenzyl bromide was substituted to the hydroxyl group of the polymer to synthesize photosensitive polyimide. The structure of the polymerized PSPI was analyzed by NMR and FT-IR. Thermal stability was also evaluated by TGA. |
저자 |
송광식, 허윤정, 백정주, 박성만, 김영랑, 장기철, 김영훈, 이효선, 배근열, 최경호, 신교직
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소속 |
한국생산기술(연) |
키워드 |
polyimide; photopolymer; PAG
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E-Mail |
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