| 학회 | 한국재료학회 |
| 학술대회 | 2011년 봄 (05/26 ~ 05/27, 제주 휘닉스 아일랜드) |
| 권호 | 17권 1호 |
| 발표분야 | E. Structural Materials and processing Technology(구조재료 및 공정기술) |
| 제목 | Property Evaluation of Mo Sputtering Target Fabricated by SPS and its Thin-film |
| 초록 | Pure Molybdenum is an important refractory metal used for a wide scale of engineering applications, due to advantageous properties. Some examples are ribbons and wires for lighting technology, semiconductor base plates for high-temperature furnaces, spraying wires for automotive industry and sputter targets or evaporation sources for coating technology. Components from pure Molybdenum or its alloys are produced either by powder metallurgy or by melting process. Generally, powder metallurgy route is preferred since a fine-grained microstructure is obtained, which improve the mechanical properties of final products considerably. Additionally, the powder route is the exclusive possibility for production of molybdenum-copper alloys or for doping molybdenum with high-temperature resistant oxides. Spark Plasma Sintering (SPS) is possible to sinter at low temperature and short time because of activating the powder surface applying a high-voltage pulse current between gaps in powder. It has advantages that fabrication of microstructure compact and high densification therefore, SPS has been studying and applied on the development of the target material recently. Compared to conventional sintering methods applying external pressure like Hot Pressing(HP) or Hot-Isostatic-Pressing (HIP), densification by SPS is extremely fast. Thus, the sintering temperatures can be lower which limits the grain growth. Sputtering target is required high-purity, high-density and fine-grained microstructure. SPS process has advantages that can be obtained good properties as mentioned above. The objective of this study is to investigate the microstructure and mechanical properties of molybdenum sputtering target fabricated by optimized SPS processes such as temperature, duration time, pulse ratio and pressure. The SPS process is progressed at 1200℃-60MPa in a vacuum atmosphere, and then the properties of Mo sintered-bodies such as purity, density and microstructure were investigated by ICP, SIMS, EBSD and TEM. The thin-film by using the SPSed Mo sputtering coated on Si/SiO2 substrate by sputter equipment (SRN-100) and then its thin film was analyzed by XRD, TEM, SIMS. |
| 저자 | 이승민1, 박현국1, 윤희준1, 양준모2, 우기도3, 오익현1 |
| 소속 | 1한국생산기술(연), 2나노종합팹센터, 3전북대 |
| 키워드 | sputtering target; high purity and density; fine-grained microstructure; SPS |
