| 초록 |
In semiconductor industry, filtering process should be applied in order to maintain high quality of pattern. Point-of-use filter has been used for reduce defect. Microbridge defect resulted from various reasons such as hard particles and soft particles. Hard particles may be inorganic metals of Fe or Cu. Soft particles may be gel-like agglomerates from polymers and inorganic metals. The hard particles can be removed by size exclusion. However, soft particles cannot be removed by size exclusion. Instead, the soft particles can be removed by adsorption in polar membrane. In this study, polar polymers such as EVOH and aromatic polyamide were impregnated into the nylon support membrane. The soft particle rejection rate was tested by palladium nanoparticle coupled with polyvinyl pyrrolidone. The nylon membrane impregnated by aromatic polyamide has a surprising adsorption capability against palladium nanoparticle. |
