| 초록 |
In recent years, the transparent conductive flexible thin film has a lot of attention due to considerable demands for wearable devices. Reduced Graphene Oxide/Nickel Sulfide (rGO/NiS) film was produced by heat treatment process after layer-by-layered Graphene Oxide/Nickel Sulfide on a silicon wafer. The morphology and crystallinity of the samples as-obtained were characterized by XRD, UV-vis, SEM and Raman spectroscopy, respectively. This film expected to be easy for mass production because Nickel Sulfide simple production process, and it is look forward to being used in various fields such as displays, next generation energy materials, battery and electrochemistry. |
