| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Block Copolymer Patterning by UVO Etching for large-area Nanolithography |
| 초록 |
We demonstrate the formation of block copolymer with UV-ozone (UVO, λ=365 nm) etching techniques to generate ordered nanoscale lamellar structures. The UV irradiation and subsequent wet etch with acetic acid treatment were used for selectively etching horizontally aligned PMMA domains on a thin PS-b-PMMA film. However, in the case of lamellar structures, collapse of the remaining PS structures occurs by the capillary force developed between PS domains. In this study, PS-b-PMMA solution was spin coating onto patterned silica substrates for formation of aligned nanostructure. And then, expose the UVO on PS-b-PMMA film. After UVO etching, ordered block copolymer domain patterns can be prepared by removing the PMMA block. Fabrication method, UVO etching of nano-periodic structures has the many advantages such as formation of large-area defect-free pattern, cost-effectiveness and simplification of process step. |
| 저자 |
정예슬1, 김아라2, 김태성2, 김소연2, 김홍승2, 박건식1, 김동표1, 김주연1, 김진식1, 백규하1, 도이미1
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| 소속 |
1한국전자통신(연), 2한국해양대 |
| 키워드 |
block copolymer; UVO etch; nanopatterning
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| E-Mail |
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