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The effects of RF power on remote plasma atomic layer deposited Al2O3 passivation layer to improve the electrical stability of IGZO TFTs Youngbin Ko, Seokhwan Bang, Seungjun Lee, Joohyun Park, Hagyoung Choi, Jaehun Ryu, Kiyeol Ham, Seokyoon Shin, Jihoon Kim, Hyeongtag Jeon 한국재료학회 2011년 봄 학술대회 |