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The effects of Al2O3 passivation with HfO2 as a buffer layer on a-IGZO TFTs Heewang Yang, Hagyoung Choi, Joohyun Park, Seokyoon Shin, Giyul Ham, Sanghun Lee, Hyeongtag Jeon 한국재료학회 2012년 가을 학술대회 |
1 |
The effects of RF power on remote plasma atomic layer deposited Al2O3 passivation layer to improve the electrical stability of IGZO TFTs Youngbin Ko, Seokhwan Bang, Seungjun Lee, Joohyun Park, Hagyoung Choi, Jaehun Ryu, Kiyeol Ham, Seokyoon Shin, Jihoon Kim, Hyeongtag Jeon 한국재료학회 2011년 봄 학술대회 |