Photochemical dry etching and surface modification of various polymers, e.g. polymethylmethacrylate (PMMA), polyimide (PI), polyethyleneterephthalate (PET) and polytetrafluoroethylene (PTFE) were investigated with coherent and incoherent excimer UV sources. Ablation rates of PMMA were measured as a function of laser fluence and laser pulse at the wavelength lambda = 248 nm (KrF*). Decomposition and etch rates of PMMA and PI were determined as a function of UV intensity and exposure time at three different wavelengths lambda = 172 nm (Xe-2*), lambda = 222 nm (KrCl*) and lambda = 308 nm (XeCl*). The transmittance of the polymeric films was determined with a UV-spectrophotometer after different exposure times. The morphology of the exposed polymers was investigated with scanning electron microscopy (SEM). The gaseous products occurring during UV exposure were measured using mass spectrometry (MS). Chemical surface changes of the photoetched PMMA were determined by X-ray photoelectron spectroscopy (XPS). The mechanism of the photo-oxidation process of PMMA is discussed. The etching of PMMA can be explained as a result of extensive photo-oxidation. The results are compared with those obtained from mercury lamp and excimer laser experiments. Good adhesion of electrolessly deposited metal layers was achieved by irradiation of the polymeric surfaces from incoherent UV source before depositing the metal layer.