Anatase TiO2 thin films were successfully grown at room temperature on polycarbonate substrates, using RF magnetron sputtering under various conditions. The deposition parameters used to examine the photocatalytic activity of TiO2 films included RF power, sputtering pressure, argon/oxygen ratio (O-2/(Ar + O-2)) and deposition time. An orthogonal array and analysis of variance (ANOVA) were used to determine the performance of the deposition process. The effects of the deposition parameters on the structure, morphology and photocatalytic performance of TiO2 films were analyzed using scanning electron microscopy (SEM), X-ray diffraction, a contact angle meter and UV/vis/NIR spectroscopy. The RF power was found to be the factor that most affected the water droplet contact angle and the sputtering pressure was found to be the second ranking factor. The results indicate that the photocatalytic performance is improved by increasing RF power, but an increase in sputtering pressure has an adverse effect. Higher photocatalytic activity is achieved for TiO2 films using an RF power of 210 W, sputtering pressure of 0.93 Pa, argon/oxygen ratio of 30% and a deposition time of 2 h. (C) 2012 Elsevier B. V. All rights reserved.