Journal of Crystal Growth, Vol.343, No.1, 105-109, 2012
Thermodynamic analysis of vapor-phase epitaxial growth of GaAsN on Ge
In this paper, we use thermodynamic analysis to determine how the nitrogen (N) ratio in the source gases affects the solid composition of coherently grown GaAs1-xNx(x similar to 0.03). The source gases for Ga, As, and N are trimethylgallium ((CH3)(3)Ga), arsine (AsH3), and ammonia (NH3), respectively. The growth occurs on a Ge substrate, and the analysis includes the stress from the substrate-crystal lattice mismatch. Calculation results indicate that to have just a few percent N incorporation into the grown solid, the V/III ratio in the source gases should be several thousands and the input-gas partial-pressure ratio NH3/(NH3+AsH3) should exceed 0.99. We also find that the lattice mismatch stress from the Ge substrate increases the V/III source-gas ratio required for stable growth, whereas an increase in input Ga partial pressure ratio has the opposite effect. (C) 2012 Elsevier B.V. All rights reserved.
Keywords:Thermodynamic analysis;Vapor phase epitaxy;GaAsN;Semiconducting III-V materials;Solar cells