Aluminum doped zinc oxide (AZO) transparent conducting films were dynamically deposited on corning glass substrates in an in-line sputtering system operated at mid-frequency sputtering mode with excitation frequency of 40 kHz. This study addressed the surface structure as well as the electrical and optical properties after wet-chemical etching. With the increase of substrate temperature, the dominant orientation of the as-deposited films changes from (0 0 2) to (1 0 3). After wet-chemical etching, due to the quick etching rate of the (0 0 2) plane relative to the (1 0 3) plane, the surface morphology of the films deposited at different temperatures show a transition from craterlike to granular surface morphology. The experimental results demonstrate that the crystal orientation of the as-deposited films plays an important role for the etching behavior of the films. (C) 2010 Elsevier B.V. All rights reserved.