BARIUM TITANATE THIN FILMS PREPARED ON MgO (100) SUBSTRATES BY COATING-PYROLYSIS PROCESS

Kim SW; Kwon OY

Korean Journal of Chemical Engineering, Vol.16, No.1, 40-44, January, 1999

Barium titanate (BaTiO₃) thin films were prepared on MgO (100) substrates using metal naphthenate solution by a coating-pyrolysis process. Amorphous films pyrolyzed at 470℃ were crystallized to BaTiO₃ phase by heat treatment at higher temperatures. The crystallinity and alignment of the films depended on temperature and on atmosphere during heat treatment. Epitaxial BaTiO₃ film having (100)-orientation was obtained by heat treatment at 900℃ under oxygen partial pressure of 2×10^-4 atm. The epitaxial BaTiO₃ film had a lattice constant of 0.401₆ nm and displayed a smooth surface with some pores dispersed on the surface. By heat treatment in air, amorphous BaTiO₃ film was obtained at 900℃ or below, and textured film with less strong (100) orientation was obtained at 1,200℃ and consisted of grains with diameter about 0.3 μm.

Keywords:Barium Titanate;Thin Film;Coating-Pyrolysis;Crystallinity;Epitaxy

[References]

Benomar WO, Xue SS, Lessard RA, Singh A, Wu ZL, Kuo PK, J. Mater. Res., 9, 970 (1994)
Chung CW, Kim D, Korean J. Chem. Eng., 14(2), 136 (1997)
Fujimoto K, Kobayashi Y, Kubota K, Thin Solid Films, 169, 249 (1989)
Glass AM, Science, 235, 1003 (1987)
Iijima K, Terashima T, Yamamoto K, Hirata K, Bando Y, Appl. Phys. Lett., 56, 527 (1990)
JCPDS cards No. 31-174
Kaiser DL, Vaudin MD, Lotter LD, Wang ZL, Cline JP, Hwang CS, Marinenko RB, Gillen JG, Appl. Phys. Lett., 66, 2801 (1995)
Kamalasanan MN, Kumar ND, Chandra S, J. Appl. Phys., 74, 5679 (1993)
Kim DH, Kwok HS, Appl. Phys. Lett., 67, 1803 (1995)
Kim S, Hishita S, Kang YM, Baik S, J. Appl. Phys., 78, 5604 (1995)
Kim S, Manabe T, Yamaguchi I, Kumagai T, Mizuta S, Transact. J. Mater. Soc. Jpn., 20, 636 (1996)
Kim S, Manabe T, Yamaguchi I, Kumagai T, Mizuta S, J. Mater. Res., 12, 1141 (1997)
Lee IS, Kim JW, Youn CJ, Park SK, Hahn YB, Korean J. Chem. Eng., 13(5), 473 (1996)
Mclntyre PC, Cima MJ, Smith JA, Hallock RB, Siegal MP, Phillips JM, J. Appl. Phys., 71, 1868 (1992)
Moulson AJ, Herbert JM, "Electoceramics," Chapman and Hall, London, U.K., 147 (1990)
Norton MG, Cracknell KPB, Carter CB, J. Am. Ceram. Soc., 75, 1999 (1992)
Nose T, Kim HT, Uwe H, Jpn. J. Appl. Phys., 33, 5259 (1994)
Shintani Y, Tada O, J. Appl. Phys., 41, 2376 (1970)
Srikant V, Tarsa EJ, Clarke DR, Speck JS, J. Appl. Phys., 77, 1517 (1995)
Wills LA, Wessels BW, Richeson DS, Marks TJ, Appl. Phys. Lett., 60, 41 (1992)
Yano Y, Iijima K, Daitoh Y, Terashima T, Bando Y, Watanabe Y, Kasatani H, Terauchi H, J. Appl. Phys., 76, 7833 (1994)
Yoon SG, Kim HG, Chun JS, J. Mater. Sci., 22, 2629 (1987)

[Referenced By]

[1] Benomar WO, Xue SS, Lessard RA, Singh A, Wu ZL, Kuo PK, J. Mater. Res., 9, 970 (1994)

[2] Chung CW, Kim D, Korean J. Chem. Eng., 14(2), 136 (1997)

[3] Fujimoto K, Kobayashi Y, Kubota K, Thin Solid Films, 169, 249 (1989)

[4] Glass AM, Science, 235, 1003 (1987)

[5] Iijima K, Terashima T, Yamamoto K, Hirata K, Bando Y, Appl. Phys. Lett., 56, 527 (1990)

[6] JCPDS cards No. 31-174

[7] Kaiser DL, Vaudin MD, Lotter LD, Wang ZL, Cline JP, Hwang CS, Marinenko RB, Gillen JG, Appl. Phys. Lett., 66, 2801 (1995)

[8] Kamalasanan MN, Kumar ND, Chandra S, J. Appl. Phys., 74, 5679 (1993)

[9] Kim DH, Kwok HS, Appl. Phys. Lett., 67, 1803 (1995)

[10] Kim S, Hishita S, Kang YM, Baik S, J. Appl. Phys., 78, 5604 (1995)

[11] Kim S, Manabe T, Yamaguchi I, Kumagai T, Mizuta S, Transact. J. Mater. Soc. Jpn., 20, 636 (1996)

[12] Kim S, Manabe T, Yamaguchi I, Kumagai T, Mizuta S, J. Mater. Res., 12, 1141 (1997)

[13] Lee IS, Kim JW, Youn CJ, Park SK, Hahn YB, Korean J. Chem. Eng., 13(5), 473 (1996)

[14] Mclntyre PC, Cima MJ, Smith JA, Hallock RB, Siegal MP, Phillips JM, J. Appl. Phys., 71, 1868 (1992)

[15] Moulson AJ, Herbert JM, "Electoceramics," Chapman and Hall, London, U.K., 147 (1990)

[16] Norton MG, Cracknell KPB, Carter CB, J. Am. Ceram. Soc., 75, 1999 (1992)

[17] Nose T, Kim HT, Uwe H, Jpn. J. Appl. Phys., 33, 5259 (1994)

[18] Shintani Y, Tada O, J. Appl. Phys., 41, 2376 (1970)

[19] Srikant V, Tarsa EJ, Clarke DR, Speck JS, J. Appl. Phys., 77, 1517 (1995)

[20] Wills LA, Wessels BW, Richeson DS, Marks TJ, Appl. Phys. Lett., 60, 41 (1992)

[21] Yano Y, Iijima K, Daitoh Y, Terashima T, Bando Y, Watanabe Y, Kasatani H, Terauchi H, J. Appl. Phys., 76, 7833 (1994)

[22] Yoon SG, Kim HG, Chun JS, J. Mater. Sci., 22, 2629 (1987)