Direct UV photochemical functionalization of H-terminated Si(111) with bifunctional 10-undecen-l-ol was achieved with selective attachment via its vinyl end, resulting in the formation of a compact monolayer with free terminal alcohol groups. This is due to the faster radical propagation mechanism in hydrosilylation with alkene compared to the nucleophilic attack mechanism of alcohol, which is impeded by intermolecular hydrogen bonding present at room temperature. Evidence from X-ray photoelectron spectroscopy, infrared spectroscopy, and resistance to fluoride etching shows that Si C is the interfacial bond, and atomic force microscopy shows the presence of a smooth, uniform monolayer conforming to the atomic terraces of the Si(111) surface. The application of such a hydroxyl-terminated monolayer was demonstrated by tethering a bromoinitiator through surface esterification and thereafter subjecting the surface to the surface-initiated atom-transfer radical polymerization of butyl methacrylate. The poly(butyl methacrylate) brushes formed were found to be smooth (R-a < 0.3 nm) and uniform even for a thin film of 4.0 nm.