In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional (3D) structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3502640] All rights reserved.