In mixed run processes, typical in semiconductor manufacturing and other automated assembly-line type process, products with different recipes will be produced on the same tool. Product based run-to-run control can be applied to improve the process capability. The effect of product-based controller on low frequency products is, however, minimal, due to inability to track tool variations. In this work, we propose a group and product based EWMA control scheme which combines adaptive k-means cluster method and run-to-run EWMA control to improve the performance of low frequency products in the mixed run process. Similar products could be classified into the same group adaptively and controlled by a group EWMA controller. The group controller is updated by both low frequency products and similar high frequency products; so that low frequency products can be improved by shared information from similar large frequency products. However, the high frequency products are controlled by individual product-based EWMA to avoid interference of the low frequency products. The advantages of proposed control scheme are demonstrated by benchmark simulation and reversed engineered industrial applications. (C) 2010 Elsevier Ltd. All rights reserved.