Journal of Polymer Science Part A: Polymer Chemistry, Vol.48, No.11, 2418-2424, 2010
Photoreactive Nanomatrix Structure Formed by Graft-Copolymerization of 1,9-Nonandiol Dimethacrylate onto Natural Rubber
Formation of photoreactive nanomatrix structure was investigated by graft-copolymerization of an inclusion complex of 1,9-nonandiol dimethacrylate (NDMA) with beta-cyclodextrin (beta-CD) onto natural rubber particle using potassium persulfate (KPS), tert-butyl hydroperoxide/tetraethylenepentamine (TBHPO/TEPA), cumene hydroperoxide/tetraethylenepentamine (CHPO/TEPA), and benzoyl peroxide (BPO) as an initiator. The graft copolymer was characterized by H-1 NMR and FTIR after coagulation. The conversion of NDMA and the amount of residual methacryloyl group were found to be 58.5 w/w% and 1.81 w/w%, respectively, under the suitable condition of the graft-copolymerization. The morphology of the film specimen, prepared from the graft copolymer, was observed by transmission electron microscopy (TEM) after staining the film with OsO4. Natural rubber particle of about 1.0 mu m in diameter was dispersed in poly(NDMA) matrix of about 10 nm in thickness. (C) 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 2418-2424, 2010
Keywords:graft copolymers;graft-copolymerization;inclusion chemistry;inclusion complex;nanomatrix structure;natural rubber;rubber