Journal of Crystal Growth, Vol.312, No.20, 2972-2976, 2010
Global simulation of coupled carbon and oxygen transport in a Czochralski furnace for silicon crystal growth
For accurate prediction of carbon and oxygen impurities in a single crystal produced by the Czochralski method, global simulation of coupled oxygen and carbon transport in the whole furnace was implemented. Both gas-phase transportation and liquid-phase transportation of oxygen and carbon were considered. With five chemical reactions considered, SiO and CO concentrations in gas and C and O atom concentrations in silicon melt were solved simultaneously. The simulation results show good agreement with experimental data. (C) 2010 Elsevier By. All rights reserved.