Negative photoresists are materials that become insoluble in developing solution when exposed to optical radiation. This work describes the production of simple negative-working resists, demonstrating aqueous development, for potential printing plate applications. The copolymers comprised glycidyl methacrylate (GMA) and acrylic acid (AA) via free-radical solution polymerization in methyl ethyl ketone as a solvent using azobisisobutyronitrile as initiator at 60 degrees C. Characterization of the copolymers prepared was carried out via IR, H-1-NMR, and thermal analysis techniques. The copolymers of GMA/AA were successfully prepared over a wide range of composition. It was found that the copolymer containing 15 mol% of AA unit in the feed was developed with NaOH on copper plate rather than zinc plate and crosslinked in the presence of photogenerated acid (PAG) caused by acid-initiated ring-opening polymerization of pendant epoxide groups. Exposure of the resist films to UV radiation at lambda(max) = 365 nm results in the generation of acid, and the subsequent baking process at 80 degrees C for 1 mm promotes the diffusion of the PAG, which initiates the cationic crosslinking of the epoxide rings. (C) 2010 Wiley Periodicals, Inc. J Appl Polym Sci 118: 1933-1942, 2010