In this work we show a new low-temperature polycrystalline silicon (LTPS) thin film transistor (TFT) fabrication process on polyimide (PI) layers. The PI is spun on Si-wafer used as rigid carrier, thus overcoming difficulties in handling flexible freestanding plastic substrates, eliminating the problem of plastic shrinkage with high temperature processing and allowing the use of standard semiconductor equipment. LTPS TFTs are fabricated according to a conventional non self-aligned process, with source/draill contacts formed by deposition of a highly doped Si-layer and patterned by a selective wet-etching. Laser annealing is performed providing simultaneous dopant activation and crystallization of the active layer. The maximum process temperature is kept below 350 degrees C. After LTPS TFTs fabrication, the PI layer is mechanically released from the rigid carrier, which can be re-used for a new fabrication process. The devices exhibit good electrical characteristics with field effect mobility up to 50 cm(2)/V s. Analysis of electrical stability and characteristics in presence of mechanical stress is also shown. (c) 2007 Elsevier Ltd. All rights reserved.