Low-temperature deposition of (110) and (101) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite (vol 117, pg 288, 2009)

Kasemanankul P; Witit-Anan N; Chaiyakun S; Limsuwan P; Boonamnuayvitaya V

Materials Chemistry and Physics, Vol.120, No.1, 229-229, 2010

DOI10.1016/j.matchemphys.2009.09.018 Export Citation

Low-temperature deposition of (110) and (101) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite (vol 117, pg 288, 2009)

Kasemanankul P, Witit-Anan N, Chaiyakun S, Limsuwan P, Boonamnuayvitaya V