A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to 2 Structure with it thickness above 10 run. So far. the most successful approach to achieve this is surface-initiated polymerization (SIP) from e-beam structured monolayer templates in a multistep process. However, spreading of the polymer on the substrate leads to it rapid line-widening. Therefore structures with lateral resolutions well below 100 nm and thicknesses above 10 nm (aspect ratio: 0.1) were not reported yet. Our approach photoinduced, constructive, reversible nanolithography is based on nanografting within a coumarin-derivative thiol (CDT) solution using the tip of an atomic force microscope (AFM). By photodimerization and the formation of disulfide bonds, the CDT polymerizes in a single-step process. We demonstrate the highest lateral resolution in constructive nanolithography at thicknesses above 10 nm (40 nm lateral resolution at 12 nm thickness, aspect ratio: 0.3).