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Journal of Vacuum Science & Technology B, Vol.28, No.2, C2B24-C2B26, 2010
Fabrication and electron field-emission properties of titanium oxide nanowire on glass substrate
Titanium-oxide nanowires, whose diameter and length were in the order of 10 nm and 1 mu m, respectively, were successfully fabricated directly on a glass substrate. The fabrication process adopted is very simple, in which the sputter-coated titanium film was immersed into NaOH solution at 80 degrees C and annealed at 500 degrees C in vacuum. Field-emission current from the titanium-oxide nanowires synthesized on a glass substrate was first observed, whose turn-on field was approximately 4 V/mu m.
Keywords:annealing;electron field emission;nanofabrication;nanowires;semiconductor materials;semiconductor thin films;silicon compounds;sputtered coatings;titanium compounds