A technique to fabricate an imprint template is proposed, based on a direct replication of the electronic-beam lithography resist patterns over a flexible conductive polymer substrate. This approach will simplify the template-making process because no anisotropic dry etching is required to transfer the resist pattern into a template material as usual. The flexible polymer film used as the substrate will be helpful during the detaching step of the template obtained; moreover, the flexibility of the substrate can be used to fabricate templates with curved-surface patterns. Using the technique, both the polymer templates and metal templates can be fabricated, and the above advantages will allow the templates to obtain the high-fidelity patterns directly from the electronic-beam lithography.