Charged particle nanopatterning techniques based on electron and ion multibeam projection techniques are finding increased industrial interest for the fabrication of leading-edge complex masks, nanoimprint templates, and,-using maskless and resistless techniques,-for nanosystem device research and development. A proof-of-concept tool for ion projection multibeam nanopatterning has been realized. Inserting a programable aperture plate system with integrated 0.25 mu m complementary metal oxide semiconductor electronics, providing switchable beams of 2.5x2.5 mu m(2) size, with 200x ion-optical reduction, 43 000 programmable beams of 12.5 nm size were obtained, demonstrating 20 nm resolution capability.