Journal of Vacuum Science & Technology A, Vol.27, No.4, 799-802, 2009
Structural and morphological evolution of gallium nitride nanorods grown by chemical beam epitaxy
The morphological and structural evolution is presented for GaN nanorods grown by chemical beam epitaxy on (0001) Al2O3 substrates. Their structural and optical properties are investigated by x-ray diffraction, scanning and transmission electron microscopy, and temperature-dependent photoluminescence measurements. While increasing the growth temperature and the flow rate of radio-frequency nitrogen radical, the three-dimensional growth mode will be enhanced to form one-dimensional nanostructures. The high density of well-aligned nanorods with a diameter of 30-50 nm formed uniformly over the entire sapphire substrate. The x-ray diffraction patterns and transmission electron microscopic images indicate that the self-assembled GaN nanorods are a pure single crystal and preferentially oriented in the c-axis direction. Particularly, the "S-shape" behavior with localization of similar to 10 meV observed in the temperature-dependent photoluminescence might be ascribed to the fluctuation in crystallographic defects and composition.
Keywords:chemical beam epitaxial growth;gallium compounds;III-V semiconductors;nanostructured materials;photoluminescence;scanning electron microscopy;semiconductor growth;texture;transmission electron microscopy;X-ray diffraction