The present study reports on the mechanical and structural properties of W/W-C multilayered thin films with bilayer periods I > ranging from 2.5 to 100 nm. Films were grown by reactive sputtering radio frequency on Si (100) substrate. X-ray diffraction (XRD), grazing incidence X-ray diffraction (GIXRD) and X-ray reflectivity were used to globally characterise the multilayers structure. Hardness and Young modulus have been determined using nanoindentation with a Berkovich tip. The XRD and the GIXRD diagrams revealed the presence of three phases: WC1-x randomly oriented, W2C with (100) preferred orientation and W with (110) preferred orientation. An increase in hardness is observed with decreasing period I >, reaching a maximum value of similar to 26 GPa at I > = 2.5 nm.