Journal of Crystal Growth, Vol.311, No.14, 3636-3639, 2009
Carbon reduction and antimony incorporation in InGaAsSb films grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony
InGaAsSb layers nearly lattice-matched to InP were grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony (TDMASb). Secondary-ion mass spectroscopy measurements revealed that TDMASb is useful not only as an Sb source but also as an additive that reduces the incorporation of C into the film from group-III metalorganic sources. In the room-temperature photoluminescence spectrum, the incorporation of Sb into InGaAs shifted the peak wavelength from 1.66 to 1.75 mu m and, simultaneously, the peak intensity of InGaAsSb became more than twice that of InGaAs. (C) 2009 Elsevier B.V. All rights reserved.
Keywords:Metalorganic molecular beam epitaxy;Antimonides;Semiconducting III-V materials;Semiconducting quarternary alloys