The effect of electron beam pretreatment of fused silica glass upon its surface functional composition and possibility for subsequent immobilization of methacryloxypropyl-trimethoxysilane (MOPTMS) layer is studied using FTIR spectroscopy and adsorption of acid-base indicators. The content of Brensted acidic centers (silanol groups) on the irradiated fused silica surface is found to follow an "oscillatory'' trend as function of the absorbed dose below 100 kGy at electron beam processing due to the alternating reactions of hydroxylation (probably as a result of Si-O-Si bond disruption and interaction with radiolyzed physically adsorbed water) and thermal dehydration/dehydroxylation at radiation heating. The best conditions for MOPTMS layer formation are based on the increased acidity of both silica surface (formation of acidic hydroxyls) and the reaction medium (MOPTMS deposition from acetic acid solution). The optimal value of absorbed dose at electron beam processing providing the highest efficiency of MOPTMS grafting is 50 kGy at accelerated electron energy 700 keV. Electron beam pretreatment of fused silica surface is shown to provide more efficient MOPTMS immobilization in comparison with conventional chemical and thermal grafting procedures. The obtained results are promising for the enhancement of the processes for the production of fused silica glass capillaries for electrochromatography and electrophoresis at the stage of an intermediate bifunctional layer formation required for the subsequent deposition of specific polymer coatings. (C) 2009 Elsevier B.V. All rights reserved.