With a view to controlling the density of carbon nanofibers (CNFs), the density of Ni catalysts was varied using direct current (dc) electroplating technique coupled with titanium (Ti) buffer layer which is deposited between catalytic layer and substrate. The dc electroplating technique is used for the deposition and formation of islands of Ni catalysts simultaneously, without any additional process. The islands of Ni catalysts were formed on the substrate with Ti buffer layer, while the smooth and continuous film of Ni catalyst was formed on the substrate without the Ti buffer layer, using the same electroplating process. The site density of Ni catalysts was controlled via the dc electroplating technique coupled with the deposition of Ti buffer layer successfully. Then, CNFs were synthesized using a direct current plasma enhanced chemical vapor deposition (dc-PECVD) system at a temperature of 480 S C. The morphologies of the electroplated Ni catalysts and CNFs were compared at different electroplating conditions. The CNFs grown from density-controlled Ni catalysts were found to have the turn-on fields of 2.5 and 5.0 V/mu m for current densities of 1 mu A/cm(2) and 1.4 mA/cm(2), respectively. (c) 2008 American Vacuum Society.