화학공학소재연구정보센터
Korean Journal of Chemical Engineering, Vol.25, No.4, 874-880, July, 2008
Diffraction efficiency change in PVA/AA photopolymer films by photosensitive inorganic compound addition
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The highest diffraction efficiency (DE) value after illumination and post-curing of photopolymer films were obtained at the SeO2/Acrylamide (AA) Ratios of AA 3.0 g, SeO2 1.0 g and the DE’s were stable values of over 90%. By the addition of SeO2, the maximum DE at the initial stage of illumination was reached at 300 seconds, which suggests SeO2 slows down the photopolymerization of. DE variation curve for the optimum composition during extendedtime illumination of 9,000 seconds resembles a sine curve due to the combination of the monomer diffusion and the photopolymerization, and the photopolymer film expanded at about 8% after photopolymerization due to monomer migration.
  1. Huawen Y, Mingju H, Zhongyu C, Lisong H, Fuxi G, Proc. of SPIE, 5060, 199 (2003)
  2. Blaya S, Carretero L, Mallavia R, Fimia A, Madrigal RF, Ulibarrena M, Levy D, Appl. Optics, 37, 7604 (1998)
  3. Neipp C, Gallego S, Ortuno M, Marquez A, Belendez A, Pascual I, Opt. Commun., 224, 27 (2003)
  4. Curtis K, Psaltis K, Appl. Optics, 31, 7425 (1992)
  5. Rhee US, Caulfield HJ, Shamir J, Vikram CS, Mirsalehi MM, Opt. Eng., 32, 1839 (1993)
  6. Pu P, Curtis K, Psaltis D, Opt. Eng., 35, 2824 (1996)
  7. Odian G, Principles of polymerization, John Wiley & Sons, New York (1991)
  8. Smothers WK, Monroe RM, Weber AM, Keys DE, SPIE, 1212, 20 (1990)
  9. Calixto S, Appl. Optics, 26, 3904 (1987)
  10. Booth BL, Appl. Optics, 14, 593 (1975)
  11. Zager SA, Weber AM, SPIE, Practical Holography V, 1461 (1991)
  12. Park J, Kim E, Journal of Korean Society for Imaging Science & Technology, 8, 22 (2002)
  13. Garcia C, Pascual I, Costela A, Garcia-Moreno I, Gomez C, Fimia A, Sastre R, Appl. Optics, 41, 2613 (2002)
  14. Blaya S, Acebal P, Carretero L, Fimia A, Opt. Commun., 228, 55 (2003)
  15. Gabriele W, Ip.com Journal, 3, 29 (2003)
  16. Sheridan JT, O’Neill FT, Kelly JV, Trends in Optics and Photonics, 87, 206 (2003)
  17. Kow H, Shi W, Tang L, Ming H, Appl. Optics, 42, 3944 (2003)
  18. Kou HG, Asif A, Shi WF, Eur. Polym. J., 38, 1931 (2002)
  19. Steckman GJ, Shelkovnikov V, Berezhnaya V, Gerasimova T, Solomatine I, Psaltis D, Opt. Lett., 25, 607 (2000)
  20. Blaya S, Carretero L, Madrigal RF, Fimia A, Opt. Commun., 173, 423 (2000)
  21. Jang SJ, Park JH, Son CH, Chung HB, J. KIEEME, 13, 781 (2000)
  22. Chun JY, Yeo CH, Lee HY, Chung HB, J. KIEEME, 10, 89 (1998)
  23. Kim D, Ko J, Yoon D, Kim Y, Southeast Asia Regional Symposium on Chemical Engineering (RSCE2005), 6 (2005)
  24. Kim D, Ko J, Kim Y, Journal of The Society of Information Storage Systems, 21, 112 (2005)
  25. Kim D, Kim Y, Nam S, Lim J, Journal of Industrial and Engineering Chemistry, 12, 762 (2006)
  26. Choi YS, Kim N, Journal of Research Institute for Computer and Information Communication, 6, 105 (1998)