A plasma-polymerized cyclohexane (PPCHex) thin film was characterized by using Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry along with a principal component analysis (PCA). The PPCHex thin film was deposited onto a silicon substrate by using an inductively coupled plasma chemical vapor deposition method and cyclohexane as a precursor. The chemical composition of the PPCHex surface was controlled in a reproducible manner as a function of substrate bias plasma power. A PCA of the TOF-SIMS data also gave systematic insight into the surface chemical compositions and molecular cross-linking on plasma-polymerized thin films as a function of substrate bias plasma power. PPCHex thin film made at 100 W plasma power had the least amount of oxygen functional groups such as the C-O-H form on the surface than the one made at 10 W plasma power. (c) 2007 American Vacuum Society.