화학공학소재연구정보센터
Applied Surface Science, Vol.254, No.4, 850-854, 2007
Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization
A comparison is made between the theoretical determination of the interference contrast function with fabricated two-dimensional hexagonal structures of submicron lattice constant. Experiments were performed using a siloxane based hybrid organic-inorganic material and a holographic lithography method. Thin hybrid structured layers were fabricated and characterized for different conditions of beam polarizations between 0 degrees and 90 degrees. As a result, the photo patterning appears to be strongly dependent on beam polarization in accordance with theoretical predictions. (c) 2007 Elsevier B.V. All rights reserved.