Chemistry Letters, Vol.36, No.10, 1266-1267, 2007
Patterning of self-assembled thin films using vacuum ultraviolet irradiation through anodic porous alumina mask
The high-throughput patterning of self-assembled monolayer (SAM) on An substrates could be achieved by vacuum ultraviolet (VUV: lambda = 172 nm) irradiation through an anodic porous alumina mask. The fluorescence image of the patterned SAM indicated the formation of a hole array on the submicron scale identical to that in the alumina mask.