First steps are taken towards computer simulation of the atomistic mechanism taking place during the supersaturation induced local metal deposition method, as developed by Schindler and coworkers [D. Hofmann, W. Schindler, J. Kirchner, Appl. Phys. Lett. 73 (1998) 3279]. Using a combination of stochastic Langevin dynamics (LD) and deterministic atom dynamics (AD), different results are observed depending on the model systems considered. For instance, when a profile of neutral diffusing species is used, atom dispersion over the whole electrode was found, whereas when charged species are introduced to the model system, a clear definite nucleation area was observed underneath the tip. The present computer simulations suggest that in the early stages of the process of cluster generation, the strong ion-ion repulsion may play an important role if the nanostructuring process is achieved in the nanosecond range. At the same time, a fast Co/Au surface mixing was observed in the top layer of the substrate in these short simulation times. (c) 2006 Elsevier B.V. All rights reserved.