We present a fabrication procedure that can form large-scale periodic silicon nanopillar arrays for 2D nanomold which determines the feature size of nanoimprint lithography, using modified nanosphere lithography. The size of silicon nanopillars can be easily controlled by an etching and oxidation process. The period and density of nanopillar arrays are determined by the initial diameter of polystyrene (PS) spheres. In our experiment, the smallest nanopillar has a full width half maximum (FWHM) of approximately 50 mn, and the density of silicon pillar is similar to 10(9)/cm(2). Using this approach, it is possible to fabricate 2D nanoimprint lithography mask with 50 mn resolution. (c) 2007 Elsevier B.V. All rights reserved.