화학공학소재연구정보센터
Solid-State Electronics, Vol.49, No.11, 1862-1866, 2005
Scaling effects in dual-bit split-gate nitride memory devices
This paper investigates the aggressive scaling of a dual-bit split-gate memory device based on nitride storage. Devices operating with very short storage area lengths of less than 10 run are demonstrated. Using a optimized erase scheme, the erase performance is drastically enhanced as the storage area is scaled down. It is shown that this device allows for very aggressive scaling without having the main problems associated with the two bits interference as seen in other concepts. (c) 2005 Published by Elsevier Ltd.