화학공학소재연구정보센터
Solid-State Electronics, Vol.44, No.7, 1187-1189, 2000
A novel channel resistance ratio method for effective channel length and series resistance extraction in MOSFETs
A resistance ratio method for electrical effective channel length and series resistance extraction is developed and verified on an advanced 0.35 mu m LDD CMOS technology. This method avoids the gate bias range optimization required in the widely used "shift-and-ratio" (S&R) method, which is usually technology specific, while retaining the single transistor algorithm nature of S&R.