A novel method of fabricating multifaceted and nanobored particle arrays via colloidal lithography using colloidal-crystal layers as masks for anisotropic reactive-ion etching (RIF) is reported. The shape of the sculpted particles is dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, the RIF conditions, and the matrix (or mask) structure. in colloidal lithography. Arrays of non-spherical particles with sculpted shapes, which to date could not otherwise be produced, are fabricated using a tilted anisotropic RIF process and the layer-by-layer growth of a colloidal mask. These nonspheric spherical particles and their ordered arrays can be used for antireflection surfaces, biosensors, and nanopatterning masks, as well as non-spherical building blocks for novel colloidal crystals. In addition, polymeric particles with patterned holes of controlled depths obtained by the present method can be applied to the fabrication of functional composite particles.