Electrochemical deposition of hematite (alpha-Fe2O3) thin films was investigated on SnO2:F covered glass substrates. A new electrochemical method to obtain hematite thin films through a potential cycling procedure in an aqueous solution of Fe(III)+KF+H2O2 at room temperature is presented. The electrodeposited iron oxide thin films submitted to an annealing treatment showed a good quality and crystallinity. X-ray diffraction analysis confirmed the presence of the rhombohedrally centered hexagonal structure: alpha-Fe2O3, hematite, as the sole crystalline phase. A bandgap energy of ca. 2.0 eV was measured for these films. (c) 2006 The Electrochemical Society.