In this work, we developed a continuous flow microreactor that is capable of overcoming the drawbacks associated with chemical bath deposition. Uniform, smooth, and highly oriented nanocrystalline CdS semiconductor thin films were successfully deposited on oxidized silicon substrates at low temperature (80 degrees C) using this microreactor. Functional thin-film transistors with an effective mobility of 1.46 cm(2)/V s were fabricated from the as-deposited films without any postannealing process. This process is a potentially low-cost avenue for the fabrication of thin-film electronics on flexible polymeric substrates. (c) 2006 The Electrochemical Society.