Nonvacuum electrodeposition was used to prepare biaxially textured Ni coatings on Ni-W substrates. The samples were characterized by X-ray diffraction (including theta/2 theta, pole figures, omega scans, and phi scans), and atomic force microscopy. Pole-figure scans show that electrodeposited (ED) Ni on textured Ni-W (3 atom %) is 99.3% cube textured. Full width at half-maximum values of the omega scan and phi scan of the electrodeposited Ni layers were comparable to the Ni-W base substrates, indicating good biaxial texturing. The buffer structures were completed on these types of seed ED-Ni layers by pulsed-laser-deposited (PLD) CeO2/YSZ/CeO2. We obtained a critical current density of 1.8 MA/cm(2) at 75.2 K in 600 Gauss magnetic field for PLD YBa2Cu3O7-delta/CeO2/YSZ/CeO2/ED-Ni/Ni-W. (C) 2004 The Electrochemical Society.