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Electrochemical and Solid State Letters, Vol.7, No.9, G179-G181, 2004
Formation of nonalloyed low resistance Ni/Au ohmic contacts to p-type GaN using Au nanodots
The effects of the insertion of Au nanodots (4-10 nm in diameter) at the Ni/GaN interface on the electrical properties of Ni/Au ohmic contacts to p-type GaN have been investigated. As-deposited Ni/Au contacts with Au nanodots show better electrical behavior than contacts without Au nanodots. Nanodot contacts produce a specific contact resistance of 8.4 x 10(24) Ohm cm(2). The multiquantum-well light-emitting diodes (LEDs) are fabricated with the nanodot Ni/Au contact layers. Nanodot LEDs show a lower operating voltage compared with LEDs made with a conventional Ni/Au contact layer. (C) 2004 The Electrochemical Society.