A method for fabrication of calcium phosphate films on crystalline silicon substrates which employs it high energy dc Spark on silicon surfaces in the presence of Ca-10(PO4)(6)(OH)(2) is described. Such a process kinetically traps the desired Calcium phosphate on the substrate with concomitant formation of a porous layer. Scanning electron micrographs of the silicon Substrate show a nanoporous surface morphology for those areas exposed to spark processing, Energy dispersive X-ray analysis and infrared vibrational spectroscopy of the spark-processed regions of the Si substrate are clearly consistent with the presence of the desired biologically relevant material. In conjunction with an automated stage. facile formation of deliberate micrometer-size patterns is demonstrated.