Poly(siloxyethylene glycol)*) with pendant vinyl groups (PVSE) was synthesized by polycondensation of oligo(ethylene glycol) (MW = 300) and diaminodivinylsilane. PVSE300 thus obtained is soluble in cold water. The PVSE300 coupled with a polythiol compound shows properties of a negative working photoresist. A negative tone image was obtained by development with water at 4 degrees C. PVSE300 is a new type of Si-containing polymer resist which can be developed by water.