Self-assembling block polymers can act as the building blocks of future advanced nanotechnologies based on "bottorn-up" fabrication methods. "Top-down" lithographic approaches offer arbitrary geometrical designs and superior nanometer-level precision, accuracy, and registration, as illustrated in the figure. By combining "bottom-up", self-assembly with "top-down" patterned templates, templated-self-assembly (TSA) emerges as an innovative nanofabrication method.