Advanced Materials, Vol.16, No.19, 1732-1732, 2004
Selective formation of inverted opals by electron-beam lithography
Lateral control of the fabrication of selectively inverted opals using polymer-silica composites is reported. Poly(methyl methacrylate)-SiO2 composite opals obtained by chemical vapor deposition can be patterned by electron-beam lithography and developed to produce silica inverse opals with well-defined extrinsic defects (see Figure).