Metal nanowire thin films have been obtained by electrodeposition into mesoporous silica thin-film templates, resulting in nanowire arrays that reflect the pore structure of the template. Removal of silica is achieved via annealing followed by etching to leave mechanically strong freestanding metal nanowire films (see Figure). These metal films have many potential applications, such as electrodes, optical hosts, catalysts, magnetic materials, photovoltaic devices, and sensors.